The Helios C200 characteristics an advanced temperature measurement and Manage procedure combined with an active compensation algorithm for various wafer emissivities. ???? ?????????? ???: ?????? ?????? ? ????????, ?????? ?????? ? ???????, ?????? ?????? ? ????????, ?????? ?????? ? ???????????, ?????? ?????? ? ?????????????, ????? ??? ??????? ?????, ????????? ????? https://martine828aip0.snack-blog.com/profile